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How to improve throughput in direct laser interference patterning: Top-hat beam profile and burst mode

 
: Voisiat, Bogdan; Ströbel, Joachim; Du, Keming; Lasagni, Andrés-Fabián

:

Klotzbach, Udo (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Laser-based Micro- and Nanoprocessing XIV : 3-6 February 2020, San Francisco, California
Bellingham, WA: SPIE, 2020 (Proceedings of SPIE 11268)
ISBN: 978-1-5106-3299-8
ISBN: 978-1-5106-3300-1
Paper 112680Y, 7 pp.
Conference "Laser-Based Micro- and Nanoprocessing" <14, 2020, San Francisco/Calif.>
Bundesministerium fur Wirtschaft und Energie BMWi (Deutschland)
ZF4006619
English
Conference Paper
Fraunhofer IWS ()
laser application; profiling; laser sources; beam shaping; diffractive optical elements; laser ablation; pulsed laser operation

Abstract
This study describes the implementation of a top-hat pulsed laser for high-throughput structuring using Direct Laser Interference Patterning (DLIP). Using two and four laser beams, dot and line-like periodic surface structures were produced, respectively. The top-hat laser profile allows treating the surface of the target materials without the need to overlap the different laser pulses and thus being capable of reducing the processing time compared to Gaussian energy distributions. Similarly, using a burst of pulses, the ablation efficiency of the DLIP process could be significantly improved. Finally, ablation tests on stainless steel samples are presented and discussed.

: http://publica.fraunhofer.de/documents/N-590444.html