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Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering

: Weber, J.; Schulz, U.; Kaiser, N.; Bartzsch, H.; Frach, P.


Amra,C.; Kaiser, N.; Macleod, H.A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Thin Films II : SPIE Conference on Optical Systems Design, 12-16 September 2005, Jena, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5963)
ISBN: 0-8194-5981-X
Paper 596327
Conference on Optical Systems Design <2005, Jena, Germany>
Conference Paper
Fraunhofer FEP ()
optical coating; optical coatings and filters; plasma applications in manufacturing and materials processing; sputter deposition

Evaporation and reactive pulse magnetron sputtering are two methods to deposit broadband antireflection coatings at low temperatures. The performance of broadband antireflective coatings on polycarbonate (PC) deposited by these methods is shown. Plasma-treatment of the plastic substrates has an important effect on the adhesion of the coating system on the substrate. For sputtering different parameter sets for the pre-treatment as well as the deposition pressure and their effect on adhesion were examined for polycarbonate substrates. Furthermore evaporation and reactive pulse magnetron sputtering were compared with regard to the adhesion of broadband antireflective coatings on PC.