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Linear extended ArcJet-CVD - a new PECVD approach for continuous wide area coating under atmospheric pressure

 
: Hopfe, V.; Rogler, D.; Mäder, G.; Dani, I.; Landes, K.; Theophile, E.; Dzulko, M.; Rohrer, C.; Reichhold, C.

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Chemical vapor deposition: CVD 11 (2005), No.11-12, Special Issue: Atmospheric Pressure Plasma Enhanced CVD (AP-PECVD), pp.510-522
ISSN: 0948-1907
ISSN: 1521-3862
English
Journal Article
Fraunhofer IWS ()

Abstract
A new type of DC-powered plasma source (LARGE) was developed and evaluated for continuous plasma-enhanced (PE) CVD under atmospheric pressure. The linear extended emanating plasma sheet was scaled-up to various working widths with the result that a half meter range has already been achieved. A CVD reactor was designed for continuous deposition of non-oxide materials. The reactor operates in a remote atmospheric pressure (AP) PECVD configuration with typical deposition rates of 5-50 nm s-1 (static) and 0.1-1.0 nm m s-1 (dynamic).The potential application range of the ArcJet-CVD technology was evaluated by screening studies with various substrates, (stainless steel, glass, silicon wafers) and coating materials (silica, carbon, silicon nitride). In-situ process characterization has been provided by both optical emission and Fourier transform infrared (FTIR) spectroscopy. A range of atomic and molecular intermediates, precursor fragments, and reaction products were identified, leading to the conclusion that a complete conversion of the element-organic precursors into an inorganic layer takes place.

: http://publica.fraunhofer.de/documents/N-57564.html