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Simulation of microparticle motion and contamination in plasma coating systems

: Schulz, Philipp; Pflug, Andreas; Kricheldorf, Hans-Ulrich


Journal of vacuum science and technology B. Microelectronics and nanometer structures 38 (2020), No.2, Art. 022203, 8 pp.
ISSN: 0734-211X
ISSN: 1071-1023
ISSN: 2166-2746
ISSN: 2166-2754
International Symposium on Sputtering and Plasma Processes (ISSP) <15, 2019, Kanazawa>
Journal Article, Conference Paper
Fraunhofer IST ()
plasma collisions; thermophoresis; Van der Waals forces; software engineering; plasma properties and parameters; Maxwell-Boltzmann distribution; fluid mechanics; plasma simulation; sputter deposition; dust plasma interactions

The authors developed a microparticle simulation for low-pressure plasma environments occurring in certain plasma coating systems. The simulation is based on a theoretical model for the forces and currents acting on microparticles and takes place in a 3D geometry modeled after the coating chamber. As a test case, the Enhanded Optical Sputtering System was used, and the resulting size distribution functions for two different microparticle species were compared with experimental size distributions, showing a qualitative agreement and yielding some explanations for the experimental results.