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Spotless arc activated reactive large area EB-PVD of titanium oxide and titanium nitride

Mit spotfreiem Lichtbogen aktivierte, großflächige Reaktions-Elektronenstrahlbedampfung von Titanoxid und Titannitrid
: Steuer, C.; Reinhold, E.; Scheffel, B.; Metzner, C.

Xie, Q.:
Technology innovation and circular economy. Proceedings of the 2nd Baosteel biennial academic conference 2006. Vol.2 : Shanghai, China, May 25 -26, 2006
Shanghai: Shanghai Scientific and Technological Literature Publishing House, 2006
ISBN: 7-5439-2947-3
Baosteel Biennial Academic Conference <2, 2006, Shanghai>
Conference Paper
Fraunhofer FEP ()
Zerstäuben; Sputtern; Aufdampfen; Plasma-PVD; Elektronenstrahlaufdampfen; Titanoxid; Titannitrid

Plasma activation of EB-PVD (electron beam physical vapor deposition) allows to increase density, hardness, refractive index and other properties of evaporated coatings. This contribution refers to reactive SAD (spotless arc activated deposition) of coatings from the titanium compounds TiO2 and TiN. Electron beam evaporation is combined with the ignition of a spotless arc discharge on the EB heated titanium metal and additional process gas inlet. The process combination has been extended to large area dimensions. Achieved layer properties, coating rates and layer thickness distributions on large substrates will be presented. The technological capacity of reactive large area SAD will be considered with regard to advantageous applications.