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Plasma-etched nanostructures for optical applications (Presentation Recording)

: Schulz, U.; Rickelt, F.; Munzert, P.; Kaiser, N.


Lakhtakia, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Nanostructured thin films VIII : 12 - 13 August 2015, San Diego, California, United States
Bellingham, WA: SPIE, 2015 (Proceedings of SPIE 9558)
ISBN: 978-1-62841-724-1
Paper 95580G
Conference "Nanostructured Thin Films" <8, 2015, San Diego/Calif.>
Conference Paper
Fraunhofer IOF ()

A basic requirement for many optical applications is the reduction of Fresnel-reflections. Besides of interference coatings, nanostructures with sub-wavelength size as known from the eye of the night-flying moth can provide antireflective (AR) properties. The basic principle is to mix a material with air on a sub-wavelength scale to decrease the effective refractive index. To realize AR nanostructures on polymers, the self-organized formation of stochastically arranged antireflective structures using a low-pressure plasma etching process was studied. An advanced procedure involves the use of additional deposition of a thin oxide layer prior etching. A broad range of different structure morphologies exhibiting antireflective properties can be generated on almost all types of polymeric materials. For applications on glass, organic films are used as a transfer medium. Organic layers as thin film materials were evaluated to identify compounds suitable for forming nanostructures by plasma etching. The vapor deposition and etching of organic layers on glass offers a new possibility to achieve antireflective properties in a broad spectral range and for a wide range of light incidence