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Structural features and nitrogen positions in titanium oxynitride films grown in plasma of magnetron discharge

: Pichugin, Vladimir F.; Pustovalova, Alla A.; Evdokimov, Kirill E.; Konishchev, M.E.; Kuzmin, Oleg S.; Boytsova, E.L.; Beshchasna, Natalia; Ficai, Anton; Aubakirova, D.M.; Sun, Zhilei

Fulltext ()

Institute of Physics -IOP-, London:
14th International Conference on Films and Coatings 2019 : 14-16 May 2019, Saint Petersburg, Russian Federation
Bristol: IOP Publishing, 2019 (Journal of physics. Conference series 1281)
Art. 012062, 6 pp.
International Conference on Films and Coatings (ICFC) <14, 2019, Saint Petersburg>
Conference Paper, Electronic Publication
Fraunhofer IKTS ()

The paper addresses the results of the analysis of the structural features of nitrogen-containing titanium oxides films, deposited by reactive magnetron sputtering. The films have a nanocrystalline two-phase structure and consist of anatase and rutile crystallites, regardless of the coating deposition regimes. No traces of titanium nitride phase are found in the film and nitrogen atoms in oxide form are localized at the grain boundaries of the deposited film.