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  4. In Situ Solar Wafer Temperature Measurement during Firing Process via Inline IR Thermography
 
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2019
Journal Article
Title

In Situ Solar Wafer Temperature Measurement during Firing Process via Inline IR Thermography

Abstract
Herein, an inline IR thermography system as an innovative application for real‐time contactless temperature measurement of wafers-both metallized and nonmetallized-during the firing process is successfully realized in an industrial firing furnace as proof of concept and example for a thermography system in a conveyor furnace. As observed by the new system, thermocouples (TCs) seem to measure lower temperature on wafers-especially in combination with TC frames-than wafers exhibit at standard firing conditions (here up to DT ≈ 40 K). Furthermore, highly resolved spatial temperature distribution can be successfully measured on the wafer.
Author(s)
Ourinson, Daniel
Emanuel, Gernot  
Csordás, A.
Dammaß, Gunnar
Müller, H.
Sternkiker, Christoph
Clement, Florian  
Glunz, Stefan W.  
Journal
Physica status solidi. Rapid research letters  
Open Access
DOI
10.1002/pssr.201900270
Additional full text version
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Language
English
Fraunhofer-Institut für Solare Energiesysteme ISE  
Keyword(s)
  • Photovoltaik

  • Silicium-Photovoltaik

  • Metallisierung und Strukturierung

  • firing

  • measurement

  • thermography

  • assurance

  • belt furnace

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