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Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology

: Bahrenberg, Lukas; Danylyuk, Serhiy; Michels, Robert; Glabisch, Sven; Ghafoori, Moein; Brose, Sascha; Stollenwerk, Jochen; Loosen, Peter


Ukraintsev, Vladimir A. (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Metrology, Inspection, and Process Control for Microlithography XXXIII : 25-28 February 2019, San Jose, California, Unites States
Bellingham, WA: SPIE, 2019 (Proceedings of SPIE 10959)
ISBN: 978-1-5106-2565-5
ISBN: 978-1-5106-2566-2
Paper 109591X, 6 pp.
Conference "Metrology, Inspection, and Process Control for Microlithography" <33, 2019, San Jose/Calif.>
Conference Paper
Fraunhofer ILT ()
EUV; spectroscopy; nanoscale grating; semiconductor lasers; metrology

The authors report on critical dimension metrology on nanoscale gratings by means of laboratory-based spectroscopic reflectometry in the extreme ultraviolet (EUV). EUV reflectivity spectra of nanoscale gratings under grazing incidence illumination and their dependency on the geometrical grating parameters are discussed. A laboratory-based setup to measure such spectra is introduced and its main features are presented. A nanoscale grating with a grating period below100 nm, consisting of multiple nanometer-size layers of materials, is experimentally investigated with the setup. The experimental results are consequently compared to a rigorous model fit of the reflectivity and thus the ability to model the grating’s interaction with EUV radiation is shown.