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2019
Conference Paper
Titel
Spectroscopic reflectometry in the extreme ultraviolet for critical dimension metrology
Abstract
The authors report on critical dimension metrology on nanoscale gratings by means of laboratory-based spectroscopic reflectometry in the extreme ultraviolet (EUV). EUV reflectivity spectra of nanoscale gratings under grazing incidence illumination and their dependency on the geometrical grating parameters are discussed. A laboratory-based setup to measure such spectra is introduced and its main features are presented. A nanoscale grating with a grating period below100 nm, consisting of multiple nanometer-size layers of materials, is experimentally investigated with the setup. The experimental results are consequently compared to a rigorous model fit of the reflectivity and thus the ability to model the grating's interaction with EUV radiation is shown.
Author(s)