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An Overview of Return-Path Ellipsometry

: Chen, Chia-Wei

Fulltext urn:nbn:de:0011-n-5521896 (6.8 MByte PDF)
MD5 Fingerprint: 4d7f0ec634827a9877c79ad7035594ba
Created on: 19.7.2019

Beyerer, Jürgen (Ed.); Taphanel, Miro (Ed.); Taphanel, Miro (Ed.):
Proceedings of the 2018 Joint Workshop of Fraunhofer IOSB and Institute for Anthropomatics, Vision and Fusion Laboratory
Karlsruhe: KIT Scientific Publishing, 2019 (Karlsruher Schriften zur Anthropomatik 40)
ISBN: 978-3-7315-0936-3
ISBN: 3-7315-0936-9
DOI: 10.5445/KSP/1000094782
Fraunhofer Institute of Optronics, System Technologies and Image Exploitation and Institute for Anthropomatics, Vision and Fusion Laboratory (Joint Workshop) <2018, Triberg-Nussbach>
Conference Paper, Electronic Publication
Fraunhofer IOSB ()

Ellipsometry is an optical method used for characterizing materials and thin
films. The principle is based on the polarization change at a sample due to the reflection or transmission at boundaries. By the measurement of the amplitude ratio psi and the phase difference delta, the complex refractive index can be obtained. Ellipsometers can be used in various industries, e.g., semiconductor, chemistry, and display industry. The typical applications are quality control of film growth and defect inspection. In the configuration of return-path ellipsometry (RPE), the light beam is reflected twice from the sample. Thus, RPE has a higher sensitivity to the optical properties of samples. Some configurations of RPE have high tilt tolerance which is an important requirement for inline measurement. This report gives an introduction to the principle of ellipsometry and an overview of four
different types of RPE.