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Advancements in the Utilization of Screen-Printed Boron Doping Paste for High Efficiency Back-Contact Back-Junction Silicon Solar Cells

: Huyeng, J.; Lang, S.F.; Efinger, R.; Schmidt, S.; Spribille, A.; Bruge, D.; Wolf, A.; Keding, R.; Doll, O.; Clement, F.


Institute of Electrical and Electronics Engineers -IEEE-:
IEEE 7th World Conference on Photovoltaic Energy Conversion, WCPEC 2018 : A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC, 10-15 June 2018, Waikoloa Village, HI, USA
Piscataway, NJ: IEEE, 2018
ISBN: 978-1-5386-8529-7
ISBN: 978-1-5386-8530-3
World Conference on Photovoltaic Energy Conversion (WCPEC) <7, 2018, Waikoloa/Hawaii>
Photovoltaic Specialists Conference (PVSC) <45, 2018, Waikoloa/Hawaii>
Photovoltaic Science and Engineering Conference (PVSEC) <28, 2018, Waikoloa/Hawaii>
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <34, 2018, Waikoloa/Hawaii>
Conference Paper
Fraunhofer ISE ()
Photovoltaik; Silicium-Photovoltaik; Pilotherstellung von industrienahen Solarzellen; Drucktechnologie; Dotierstoff-Quelle

Screen printed boron doping paste can be used as a cost-effective and highly flexible dopant source in silicon photovoltaics. In combination with a co-diffusion approach, it can help mitigate some of the increased costs advanced solar cell concepts inherit. Aiming at the fabrication of high efficiency back-contact back-junction solar cells, we investigate the limitations of direct structured application regarding minimal feature sizes. We find minimal feature sizes of 75 and 120 μm for n ++ - and p ++ -doped regions, respectively. We also demonstrate a fully compatible and homogeneous (ΔR□/R□ = 3% rel ) co-diffusion process, creating all dopings at once.