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Defect examination of diamond crystals by surface hydrogen-plasma etching

: Jiang, X.; Rickers, C.


Applied Physics Letters 75 (1999), No.25, pp.3935-3937
ISSN: 0003-6951
ISSN: 1077-3118
Journal Article
Fraunhofer IST ()
CVD diamond; thin film

A method to examine the defects and defect distribution in diamond crystals has been developed. To make the crystal defects visible, a high-temperature hydrogen-plasma etching was employed. By a combination of scanning electron microscopy and atomic force microscopy, the etch pits of the (001) diamond faces parallel to the substrate were observed and analyzed. The defect distribution of chemical-vapor-deposited diamond crystallites corresponds exactly with that observed by transmission electron microscopy, and can be related to the growth mode during film deposition.