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Organic Contamination Workshop 2001. Proceedings

: Pfitzner, L.; Bügler, J.; Frickinger, J.
: Fraunhofer-Institut für Integrierte Schaltungen -IIS-, Erlangen

Stuttgart: Fraunhofer IRB Verlag, 2001, 188 pp. : Ill.
Organic Contamination Workshop <3, 2001, Erlangen>
Semicon Europa <2001, Erlangen>
ISBN: 3-8167-5883-5
ISBN: 978-3-8167-5883-9
Conference Proceedings
Fraunhofer IIS A ( IIS) ()
semiconductor; organic contamination; analytical technique; Contamination Control

Organic airborne molecular contamination in semiconductor device manufacturing has gained importance in the last few years. Although studies on the influence of organic contamination on certain processes are available, many questions concerning critical levels, measuring and filtration techniques remain unanswered. The Proceedings of the Organic Contamination Workshop 2001 cover all the contributions presented. The topics focus on measuring organic contamination on silicon wafers, including desorption techniques. Measuring organic contaminants in air as well as outgassing from materials used in cleanrooms is another important topic. The correlation between compounds found on silicon, found in the air and outgassing from materials is drawn. Levels that are commonly found are given and the specific impact of certain compounds on manufacturing processes is discussed. The state-of-the-art in filtration techniques is presented as well as actual problems that have occured. Theoretical aspects of surface contamination as well as critical levels are reviewed.