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Application of uracil for the preparation of low-index nanostructured layers

 
: Schulz, U.; Knopf, H.; Rickelt, F.; Seifert, T.; Munzert, P.

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Fulltext ()

Optical Materials Express 8 (2018), No.8, pp.2182-2189
ISSN: 2159-3930
English
Journal Article, Electronic Publication
Fraunhofer IOF ()

Abstract
Nanostructured layers generated by plasma etching immediately after the evaporation process can exhibit an effective refractive index down to approximately 1.15. uracil, a nucleobase derived from a pyrimidine chemical structure, has been identified to form suitable bump structures in a self-organized way. It is assumed that the molecule’s ability to form aggregates plays an essential role in initiating the structure formation. A nanostructured uracil layer has been used as the final layer of an antireflection coating to demonstrate broadband and wide-angle antireflection performance.

: http://publica.fraunhofer.de/documents/N-524428.html