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Advances in MOEMS technologies for high quality imaging systems

: Schenk, H.; Wagner, M.; Grahmann, J.; Merten, A.


Kye, J. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Microlithography XXXI : 27 February-1 March 2018, San Jose, California, Unites States
Bellingham, WA: SPIE, 2018 (Proceedings of SPIE 10587)
ISBN: 978-1-5106-1667-7
ISBN: 978-1-5106-1666-0
Paper 1058703, 10 pp.
Conference "Optical Microlithography" <31, 2018, San Jose/Calif.>
Advanced Lithography Symposium <2018, San Jose/Calif.>
Conference Paper
Fraunhofer IPMS ()

An overview of advances in MOEMS devices and technologies for high quality imaging systems is provided. A particular focus is laid on recent technological further developments possibly opening gateways to unprecedented device and system functionality by e. g.: increase of pixel count towards higher parallel operation, decrease of the mirror pitch in large arrays towards applications like high-performance holography, novel technologies for higher operation bandwidth, increase of aperture size for scanning applications like LIDAR, integration of high reflection coatings for processing of multi Watt laser radiation for marking and engraving, and phased arrays for high speed laser beam steering.