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Reproducibility and stability of nanoporous SiO2 thin film coatings

 
: Ghazaryan, L.; Szeghalmi, A.

:

Lequime, Michel (Ed.) ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Optical Thin Films VI : 14-17 May 2018, Frankfurt, Germany
Bellingham, WA: SPIE, 2018 (Proceedings of SPIE 10691)
ISBN: 978-1-5106-1919-7
ISBN: 978-1-5106-1920-3
Paper 1069110, 7 pp.
Conference "Advances in Optical Thin Films" <6, 2018, Frankfurt>
English
Conference Paper
Fraunhofer IOF ()

Abstract
In this study, single layer antireflection (AR) coatings have been realized using nanoporous SiO2 thin films made by atomic layer deposition (ALD) and wet chemical etching. The run-to-run and etch-to-etch reproducibility of nanoporous coatings have been monitored nearly one year. Excellent reproducibility of the film thickness and refractive index, and accordingly of the optical function are demonstrated. Furthermore, the stability of the coatings in vacuum as well as at 200°C has been analyzed.

: http://publica.fraunhofer.de/documents/N-520755.html