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Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems

: Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de


Hoga, M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Photomask and next-generation lithography mask technology XIII : 18 - 20 April 2006, Yokohama, Japan
Bellingham/Wash.: SPIE, 2006 (SPIE Proceedings Series 6283)
ISBN: 0-8194-6358-2
ISBN: 978-0-8194-6358-6
Paper 628319
Conference "Photomask and Next-Generation Lithography Mask Technology" <13, 2006, Yokohama>
Conference Paper
Fraunhofer IISB ()

This paper presents an evaluation of the finite-difference time-domain method (FDTD) and of the waveguide method (WG) for the simulation of typical hyper NA imaging problems. In contrast to previous comparisons of rigorous mask modeling methods, which were restricted to the assessment of few near fields, diffraction efficiencies, or aerial images at fixed imaging configurations, we compare the methods in terms of CPU-time and memory requirements, their capability to predict parameter dependencies and more global lithographic process characteristics such as process windows and through-pitch behavior.