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Deposition of multilayer optical films and rugate filters deposited by reactive magnetron sputtering

: Vergöhl, M.; Rickers, C.; Kricheldorf, U.; Schiffmann, K.; Giesel, P.; Dittrich, R.; Richter, U.

Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 49th Annual Technical Conference 2006. Proceedings : April 22 - 27, 2006, Washington, D.C. USA
Albuquerque: SVC, 2006
Society of Vacuum Coaters (Annual Technical Conference) <49, 2006, Washington/DC>
Conference Paper
Fraunhofer IST ()

Reactive magnetron sputtering was used to deposit multilayer optical coatings as well as Rugate filters. For the combination of larger areas, high throughput and high precision of the films, a rotary platter coater was developed which uses reactive pulsed magnetron sputtering. Four substrates of 40 cm diameter can be processed simultaneously. For an optimized homogeneity and film quality, linear double magnetrons were implemented.
Plasma process control is made by a lambda probe oxygen partial pressure measurement as well as by optical plasma emission spectroscopy. For in-situ process control of the growing films, a fast single wavelength in-situ ellipsometer and a spectral reflectometer is adapted and implemented into the process control softwase. All sensors are integrated via a data handler into the SPS process control. First results for the deposition of a multilayer filter as well as of Rugate filters are presented and are compared to results of RF magnetron sputtered filters.