2005
Conference Paper
Title

Mask manufacture for projection mask-less lithography (PML2)

Title Supplement
MEMS-technology for a programmable aperture plate system
Author(s)
Reimer, K.
Witt, M.
Kähler, D.
Eichholz, J.
Ratzmann, L.
Brünger, W.
Döring, H.-J.
Haugeneder, E.
Eder-Kapl, S.
Nowak, R.
Mainwork
Conference
DOI
Language
English