Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Mask manufacture for projection mask-less lithography (PML2)
MEMS-technology for a programmable aperture plate system
:
Reimer, K.; Witt, M.; Kähler, D.; Eichholz, J.; Ratzmann, L.; Brünger, W.; Döring, H.-J.; Haugeneder, E.; Eder-Kapl, S.; Nowak, R. | Behringer, U.F.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
EMLC 2005 : 21th European Mask and Lithography Conference. Proceedings : 31 January - 3 February 2005, Dresden, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5835)
ISBN: 0-8194-5830-9
pp.196-204 |
| European Mask and Lithography Conference (EMLC) <21, 2005, Dresden> |
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| English |
| Conference Paper |
| Fraunhofer ISIT () |