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Demonstrators: A vital step forward for projection mask-less lithography (PML2)

 
: Brandstätter, C.; Haugeneder, E.; Döring, H.-J.; Elster, T.; Heinitz, J.; Fortagne, O.; Eder-Kapl, S.; Lammer, G.; Jochl, P.; Löschner, H.; Reimer, K.; Saniter, J.; Talmi, M.; Eberhardt, R.; Krönert, K.

Behringer, U.F.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
EMLC 2005 : 21th European Mask and Lithography Conference. Proceedings : 31 January - 3 February 2005, Dresden, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5835)
ISBN: 0-8194-5830-9
pp.188-195
European Mask and Lithography Conference (EMLC) <21, 2005, Dresden>
English
Conference Paper
Fraunhofer ISIT ()

: http://publica.fraunhofer.de/documents/N-51208.html