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Proof-of-concept tool development for projection mask-less lithography (PML2)
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2005
Conference Paper
Titel
Proof-of-concept tool development for projection mask-less lithography (PML2)
Author(s)
Döring, H.-J.
Elster, T.
Heinitz, J.
Fortagne, O.
Brandstätter, C.
Haugeneder, E.
Eder-Kapl, S.
Lammer, G.
Löschner, H.
Reimer, K.
Eichholz, J.
Saniter, J.
Hauptwerk
Emerging lithographic technologies IX. Vol.1
Konferenz
Conference "Emerging Lithographic Technologies" 2005
DOI
10.1117/12.600458
Language
English
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Fraunhofer-Institut für Nachrichtentechnik, Heinrich-Hertz-Institut HHI
Fraunhofer-Institut für Siliziumtechnologie ISIT