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2018
Journal Article
Titel
Enabling direct laser writing of cellulose-based submicron architectures
Abstract
We report on the first and versatile cellulose-based photoresist, which can be applied in direct laser writing and allows the fabrication of structures with a resolution of less than 1 mm and a feature size of less than 500 nm via two-photon absorption. Therefore, cellulose diacetate is functionalised with methacrylic acid anhydride to introduce photo-crosslinkable side groups into the cellulose chain. The photoresist consists of the methacrylated cellulose diacetate and a photoinitiator both dissolved in acetone. The cellulose-based photoresist can be applied to generate two- and three-dimensional hierarchical structures and clears the way to the design and fabrication of biomimetic architectures solely made from biopolymers.
Author(s)
Rothammer, M.
Chair of Biogenic Polymers, Technical University of Munich, Schulgasse 16, 94315 Straubing, Germany
Heep, M.-C.
Physics Department and Research Centre OPTIMAS, University of Kaiserslautern, 67663 Kaiserslautern, Germany
Freymann, G. von
Physics Department and Research Centre OPTIMAS, University of Kaiserslautern, and Fraunhofer Institute for Industrial Mathematics ITWM, 67663 Kaiserslautern, Germany