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Two-photon laser lithography in optical metrology

 
: Hering, J.; Eifler, M.; Hofherr, L.; Ziegler, C.; Seewig, J.; Freymann, G. von

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Fulltext urn:nbn:de:0011-n-5065162 (592 KByte PDF)
MD5 Fingerprint: 7d73cd3ad3e7c438bbe4765d73b929b2
Copyright Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Created on: 15.8.2018


Feymann, Georg von ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI : 27 January - 1 February 2018, San Francisco, California, United States
Bellingham, WA: SPIE, 2018 (Proceedings of SPIE 10544)
ISBN: 978-1-5106-1573-1
Paper 1054412, 9 pp.
Conference "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics" <11, 2018, San Francisco/Calif.>
English
Conference Paper, Electronic Publication
Fraunhofer ITWM ()
direct laser writing; two-photon polymerization; additive manufacturing; calibration; artefact; material measures; areal/profile surface metrology; ISO standardization; topography measuring instrument

Abstract
Two-photon laser lithography has become one of the most promising additive manufacturing techniques on the micron scale and is applied, e.g., in fields of micro-optics and -robotics as well as optical and mechanical metamaterials. Here, we report on the feasibility, limits and general benefits of this method to fabricate material measures for the calibration of industrial optical topography measuring devices. Since calibration procedures are essential in the scientific and industrial application of those measuring instruments, appropriate material measures are highly required. In contrast to traditional manufacturing technologies, we show that two-photon laser lithography allows a highly resolved fabrication of multiple, almost arbitrary standardized calibration geometries on a micron length scale. Hereby, all structures are fabricated on only one single substrate, therefore enabling a mapping of a broad range of metrological characteristics for topography characterization. The most required calibration geometries are manufactured and analyzed regarding their aging behavior, their quality improvement by a post-UV development and the resolution limits within the manufacturing as well as the calibration process. Thus, the general industrial and scientific relevance of manufacturing material measures with two-photon laser lithography is demonstrated.

: http://publica.fraunhofer.de/documents/N-506516.html