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Economical and ecological aspects of plasma processing for industrial solar cell fabrication

: Rentsch, J.; Jaus, J.; Roth, K.; Preu, R.

Fulltext urn:nbn:de:0011-n-505939 (63 KByte PDF)
MD5 Fingerprint: 6b1a6badd1092308dfafcf9127dad553
Created on: 11.10.2012

Institute of Electrical and Electronics Engineers -IEEE-; IEEE Electron Devices Society:
Thirty-First IEEE Photovoltaic Specialists Conference 2005. Conference record : Coronado Springs Resort, Lake Buena Vista, FL, January 3 - 7, 2005
Piscataway, NJ: IEEE, 2005
ISBN: 0-7803-8707-4
Photovoltaic Specialists Conference (PVSC) <31, 2005, Lake Buena Vista/Fla.>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Plasma processing represents one possible solution to meet the requirements necessary for the realization of novel cell concepts suitable for larger and thinner wafers. Within this work, economical and ecological aspects of the new technology have been considered. The high Global Warming Potential (GWP) of the perfluorocompound etching gases necessitates waste gas abatement systems with high destruction and removal efficiencies. Plasma conversion turned out to be the most adequate and flexible solution. With an effective waste gas treatment, additional CO2 emissions due to plasma processing can be balanced not to exceed 6 month operating time of a PV system. Based on a dry, completely in-line process scheme, cost of ownership calculations show the cost reduction potential of plasma processing for mc-Si wafers compared to wet chemical state-of-the-art processing.