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Texturing of multicrystalline silicon by laser ablation

: Rentsch, J.; Bamberg, F.; Schneiderlöchner, E.; Preu, R.

Fulltext urn:nbn:de:0011-n-503142 (683 KByte PDF)
MD5 Fingerprint: 9f2617e0d820df34eb58d2171f9de04a
Created on: 13.10.2012

20th European Photovoltaic Solar Energy Conference 2005. Proceedings : Barcelona, 6-10 June 2005
München: WIP-Renewable Energies, 2005
ISBN: 3-936338-19-1
European Photovoltaic Solar Energy Conference <20, 2005, Barcelona>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

The application of laser ablation for texturing purposes represents a suitable alternative to common wet chemical texturing schemes. In this paper, a patented texturing scheme, consisting of a laser ablation step followed by plasma-chemical removal of the laser debris has been applied to conventional screen-printed multicrystalline silicon (mc-Si) solar cells. Depending on the laser parameters weighted reflectance values below 20 % are achievable with aspect ratios above 1 (depth to width). The application of the Laser-Plasma texturing scheme to conventional mc-Si solar cells results in an increase of jsc of about 1 mA/cm2 compared to planar etched reference cells indicating the improved optical properties. With a further adaptation of the front side screen-printed metallisation grid, significant improvements of the cell efficiency could be achieved in the future.