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Experimental investigation towards high throughput rapid thermal firing of EFG SI solar cells

: Horzel, J.; Grupp, G.; Preu, R.; Schmidt, W.

Fulltext urn:nbn:de:0011-n-501884 (1.0 MByte PDF)
MD5 Fingerprint: 9b67bc860d297e13d988f19a54246c75
Created on: 12.10.2012

20th European Photovoltaic Solar Energy Conference 2005. Proceedings : Barcelona, 6-10 June 2005
München: WIP-Renewable Energies, 2005
ISBN: 3-936338-19-1
European Photovoltaic Solar Energy Conference <20, 2005, Barcelona>
Conference Paper, Electronic Publication
Fraunhofer ISE ()

Within the European project FLASH rapid thermal processing (RTP) and equipment for it have been developed over the recent years. A prototype RTP system for very high throughput (> 1 wafer/ s; 10 x 10 cm2) has been finished only after the end of the official project duration and gets currently optimised with respect to temperature homogeneity. Thus the performance potential of such a RTP system had to be assessed in advance prior to the end of the project. This work focuses on the use of Rapid Thermal Firing (RTF) for the metallisation sintering process on EFG Si solar cells. A laboratory single wafer RTP system has been used to assess the influence of temperature inhomogeneity and temperature ramps that might be realistic for the high throughput RTP equipment. Results of these investigations will be presented in this publication.