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Mg doping profile in III-N light emitting diodes in close proximity to the active region

Dotierprofil von Mg in III-N Lichtemittierenden Dioden in unmittelbarer Nähe zur aktiven Zone
: Köhler, K.; Perona, A.; Maier, M.; Wiegert, J.; Kunzer, M.; Wagner, J.


Physica status solidi. A 203 (2006), No.7, pp.1802-1805
ISSN: 0031-8965
ISSN: 1862-6300
ISSN: 1521-396X
ISSN: 1862-6319
Journal Article
Fraunhofer IAF ()
III-V semiconductor; heterostructure; material property; III-V Halbleiter; Heterostruktur; Materialeigenschaft

We have investigated how in (AlGaIn)N quantum well (QW) light emitting diodes, grown by low-pressure metal-organic vapor phase epitaxy, the actual Mg doping profile close to the interface between AlGaN electron barrier and QW active region, known to be affected by both segregation of back diffusion of Mg, can be controlled and adjusted by the appropriate choice of growth parameters. Almost identical Mg doping profiles, and thus electroluminescence efficiencies which are strongly affected by the Mg doping profile, could be achieved for different combinations of Mg precursor flow and growth temperature.