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Management of metallic contamination in advanced IC manufacturing
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2005
Conference Paper
Titel
Management of metallic contamination in advanced IC manufacturing
Author(s)
Danel, A.
Renaud, D.
Besson, P.
Bigot, C.
Grouillet, A.
Claes, M.
Bearda, T.
Frickinger, J.
Hauptwerk
Cleaning technology in semiconductor device manufacturing IX
Konferenz
International Symposium on Cleaning Technology in Semiconductor Device Manufacturing 2005
Electrochemical Society (Fall Meeting) 2005
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB