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Resolution enhancements for semiconductor lithography: A computational perspective

 
: Erdmann, A.

:

Optical Society of America -OSA-, Washington/D.C.:
Imaging Systems and Applications : Part of Imaging and Applied Optics 2016; 25-28 July 2016, Heidelberg, Germany
Washington, DC: OSA, 2016
ISBN: 978-1-943580-15-6
Paper IM4F.3
Conference "Imaging Systems and Applications" (IS) <2016, Heidelberg>
Imaging and Applied Optics Congress <2016, Heidelberg>
English
Conference Paper
Fraunhofer IISB ()

Abstract
The presentation reviews optics- and material-driven resolution enhancements in DUV and EUV projection lithography for semiconductor fabrication with special emphasis on the application of computational methods for the exploration and optimization of various technology options.

: http://publica.fraunhofer.de/documents/N-491321.html