Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Promising plasma textured black silicon at etch temperatures > 0 °C for PV applications

: Gaudig, M.; Hirsch, J.; Ziegler, J.; Lausch, D.; Sprafke, A.N.; Bernhard, N.; Wehrspohn, R.B.


Optical Society of America -OSA-, Washington/D.C.:
Optical nanostructures and advanced materials for photovoltaics : Part of light, energy and the environment; from the session Ordered and Disordered Structures for Light Management (PTh2A), Leipzig, 14-17 November 2016
Washington, DC: OSA, 2016
ISBN: 978-0-9600380-4-6
Paper PTh3A.3
Conference "Optical Nanostructures and Advanced Materials for Photovoltaics" <2016, Leipzig>
Conference "Light, Energy and the Environment" <2016, Leipzig>
Conference Paper
Fraunhofer CSP ()
Fraunhofer IMWS ()

Maskless plasma texturing, as an outstanding method to fabricate highly antireflective silicon surfaces, is optimized at etch temperatures above 0 °C. We achieve excellent optoelectronic properties suitable for silicon solar cell applications.