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Pretreatment of PC as a condition for homogeneous etching of AR-nanostructures

 
: Schulz, U.; Munzert, P.; Reinhard, S.; Rickelt, F.; Knopf, H.; Weber, C.; Kaiser, N.

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Optical Society of America -OSA-, Washington/D.C.:
Optical Interference Coatings 2016 : 19-24 June 2016, Tucson, Arizona, United States
Washington, DC: OSA, 2016 (OSA Technical digest series)
ISBN: 978-1-943580-13-2
Paper FB.5
Conference" Optical Interference Coatings" (OIC) <2016, Tucson/Ariz.>
English
Conference Paper
Fraunhofer IOF ()

Abstract
The origin of surface defects appearing on plasma etched polycarbonate has been detected and eliminated successfully. As a result, broadband antireflective properties could be achieved homogenously by consecutively etching the substrate and a vacuum deposited organic layer.

: http://publica.fraunhofer.de/documents/N-490932.html