Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Properties of ALD ferroelectric Si-doped HfO2 characterized with noncontact Corona-Kelvin metrology

Presentation held at 17th International Conference on Atomic Layer Deposition, ALD 2017, 15th - 18th July 2017, Denver, Colorado, USA
 
: Polakowski, Patrick; Müller, Johannes; Marinskiy, Dmitriy; Findlay, Andrew; Edelman, Piotr; Wilson, Marshall; Lagowski, Jacek; Metzger, Joachim; Binder, Robert

2017
International Conference on Atomic Layer Deposition (ALD) <17, 2017, Denver/Colo.>
English
Presentation
Fraunhofer IPMS ()
Anfrage beim Institut / Available on request from the institute bibliothek@ipms.fraunhofer.de

: http://publica.fraunhofer.de/documents/N-481076.html