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Capacitance maximization of ultra-thin Si-capacitors by atomic layer deposition of anti-ferroelectric HfO2 in high aspect ratio structures

Presentation held at 17th International Conference on Atomic Layer Deposition, ALD 2017, 15th - 18th July 2017, Denver, Colorado, USA
 
: Riedel, Stefan; Weinreich, Wenke; Mart, Clemens; Müller, Johannes

2017, 14 Folien
International Conference on Atomic Layer Deposition (ALD) <17, 2017, Denver/Colo.>
English
Presentation
Fraunhofer IPMS ()
Anfrage beim Institut / Available on request from the institute bibliothek@ipms.fraunhofer.de

: http://publica.fraunhofer.de/documents/N-480011.html