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Comparison of innovative metallization approaches for silicon heterojunction solar cells

: Erath, D.; Pospischil, M.; Keding, R.; Jahn, M.; Lacmago Lontchi, I.; Lorenz, A.; Clement, F.

Fulltext ()

Energy Procedia 124 (2017), pp.869-874
ISSN: 1876-6102
International Conference on Crystalline Silicon Photovoltaics (SiliconPV) <7, 2017, Freiburg>
Journal Article, Conference Paper, Electronic Publication
Fraunhofer ISE ()

Within this study, different metallization approaches were investigated and compared with respect to their applicability for silicon heterojunction (SHJ) solar cells. A printed line width of 34 μm with an aspect ratio of 0.59 was reached by double fine-line screen printing. In parallel, ink jet printing and its applicability regarding in-situ curing was evaluated. It was found that spreading of the ink is substantially reduced by choosing the optimum substrate temperature, enabling for a line width of 32 μm. Successful dispensing of a low-temperature silver paste was achieved by using a ten nozzle print head. By means of screen printed contact grids on both sides, solar cells with a conversion efficiency of 21.9 % were produced with industrial precursor wafers.