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Assembly of an aperture plate system for projection mask-less lithography

 
: Mohaupt, M.; Eberhardt, R.; Damm, C.; Peschel, T.; Tünnermann, A.; Haugeneder, E.; Döring, H.-J.; Brandstätter, C.

:

Loeschner, H.:
31st International Conference on Micro- and Nano-Engineering 2005. Proceedings : 19 - 22 September 2005, Vienna, Austria
Amsterdam: Elsevier, 2006 (Microelectronic engineering 83.2006,4/9)
pp.980-983
International Conference on Micro- and Nano-Engineering (MNE) <31, 2005, Vienna>
English
Conference Paper, Journal Article
Fraunhofer IOF ()
adjustment; alignment; aperture plate system; assembly; flexure hinge; mark detection; projection mask-less lithography

Abstract
Mask-less lithography becomes more and more important to reduce cycle time and lithography costs for device prototyping and small batch ASIC manufacturing. A European consortium is developing an electron multi beam technology - called projection mask-less lithography (PML2)-for the 45 nm, 32 nm node and beyond. The multi beam blanking device (programmable "aperture plate system"-APS) is one of the challenging key elements of PML2 [H.-J. Döring et al., Proc. SPIE 5751 (2005); C. Brandstätter et al., Proc. SPIE 5835 (2005)]. This paper will focus on the precision assembly concept and the alignment procedure of the aperture plate system. Major system specifications and their influence on the sub-µm assembly and alignment accuracy will be discussed in the context of mechanical, thermal and magnetic constraints.

: http://publica.fraunhofer.de/documents/N-46710.html