Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Mask and wafer topography effects in immersion lithography

 
: Erdmann, A.; Evanschitzky, P.; Bisschop, P. de

:

Smith, B.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical microlithography XVIII. Vol.1 : 1 - 4 March 2005, San Jose, California, USA
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5754)
ISBN: 0-8194-5734-5
pp.383-394
Conference Optical Microlithography <18, 2005, San Jose/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-46546.html