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Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects

 
: Erdmann, A.

:

Behringer, U.F.W. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
EMLC 2005 : 21th European Mask and Lithography Conference. Proceedings : 31 January - 3 February 2005, Dresden, Germany
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5835)
ISBN: 0-8194-5830-9
pp.69-81
European Mask and Lithography Conference (EMLC) <21, 2005, Dresden>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-46545.html