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Design aspects for the fabrication of gratings for DFB-lasers by direct write electron-beam lithography

 
: Steingrüber, R.; Möhrle, M.

:

Kruit, P.:
Micro and Nano Engineering 2004. Proceedings of the 30th International Conference on Micro and Nano Engineering : September 19 - 22, 2004, Rotterdam, The Netherlands
Amsterdam: Elsevier, 2005 (Microelectronic engineering 78/79.2005)
pp.51-54
International Conference on Micro and Nano Engineering (MNE) <30, 2004, Rotterdam>
English
Conference Paper
Fraunhofer HHI ()

Abstract
The fabrication of gratings for DFB-lasers by direct write electron-beam lithography under consideration of design rule aspects is presented. The mostly common targeted duty cycle value of 0.5 can be either achieved by exposing a designed equal line/space ratio of 0.5 or a smaller ratio implying the necessity to raise the exposure dose in order to obtain equal lines and spaces in the developed resist pattern. We found that the latter way results in an increase of process tolerance without loosing device characteristics.

: http://publica.fraunhofer.de/documents/N-46492.html