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Investigation of the refractive index repeatability for tantalum pentoxide coatings, prepared by physical vapor film deposition techniques

: Stenzel, O.; Wilbrandt, S.; Wolf, J.; Schürmann, M.; Kaiser, N.; Ristau, D.; Ehlers, H.; Carstens, F.; Schippel, S.; Mechold, L.; Rauhut, R.; Kennedy, M.; Bischoff, M.; Nowitzki, T.; Zöller, A.; Hagedorn, H.; Reus, H.; Hegemann, T.; Starke, K.; Harhausen, J.; Foest, R.; Schumacher, J.


Applied optics 56 (2017), No.4, pp.C193-200
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Journal Article
Fraunhofer IOF ()

Random effects in the repeatability of refractive index and absorption edge position of tantalum pentoxide layers prepared by plasma-ion-assisted electron-beam evaporation, ion beam sputtering, and magnetron sputtering are investigated and quantified. Standard deviations in refractive index between 4 ∗ 10 -4 and 4 ∗ 10 -3 have been obtained. Here, lowest standard deviations in refractive index close to our detection threshold could be achieved by both ion beam sputtering and plasma-ion-assisted deposition. In relation to the corresponding mean values, the standard deviations in band-edge position and refractive index are of similar order.