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High quality strained Si/SiGe substrates for CMOS and optical devices

 
: Weber, J.; Nebrich, L.; Bensch, F.; Neumeier, K.; Vogg, G.; Wieland, R.; Bonfert, D.; Ramm, P.

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Gessner, T.:
Ninth European Workshop on Materials for Advanced Metallization 2005. Proceedings : 6 - 9 March 2005, Dresden, Germany
Amsterdam: Elsevier, 2005 (Microelectronic engineering 82.2005, 3/4)
pp.215-220
European Workshop on Materials for Advanced Metallization (MAM) <9, 2005, Dresden>
English
Conference Paper
Fraunhofer IZM ()

: http://publica.fraunhofer.de/documents/N-45660.html