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High quality strained Si/SiGe substrates for CMOS and optical devices
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2005
Conference Paper
Titel
High quality strained Si/SiGe substrates for CMOS and optical devices
Author(s)
Weber, J.
Nebrich, L.
Bensch, F.
Neumeier, K.
Vogg, G.
Wieland, R.
Bonfert, D.
Ramm, P.
Hauptwerk
Ninth European Workshop on Materials for Advanced Metallization 2005. Proceedings
Konferenz
European Workshop on Materials for Advanced Metallization (MAM) 2005
DOI
10.1016/j.mee.2005.07.012
Language
English
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Fraunhofer-Institut für Zuverlässigkeit und Mikrointegration IZM