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Deposition of Al and Cu nanoparticles on silicon wafer using a picosecond Nd: YAG Laser. An experiment-based parameter optimization guide

 
: Azhdast, M.H.; Kossatz, M.; Eichler, H.J.; Lang, K.-D.; Glaw, V.

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Optical Society of America -OSA-, Washington/D.C.:
CLEO: Applications and Technology : Part of CLEO: 2017; 14-19 May 2017, San Jose, California, United States
Washington, DC: OSA, 2017
ISBN: 978-1-943580-27-9
Paper JTu5A.12, 2 pp.
Conference on Lasers and Electro-Optics - Applications and Technology (CLEO A&T) <2017, San Jose/Calif.>
English
Conference Paper
Fraunhofer IZM ()

Abstract
The optimization of parameters for laser deposition of nanoparticles on Si-wafer is studied. The threshold of laser energy, pulses per laser shot and overlapping is crucial in order to achieve the best deposition results.

: http://publica.fraunhofer.de/documents/N-455948.html