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1.9 µm waveguide laser fabricated by ultrafast laser inscription in Tm:Lu2O3 ceramic

: Morris, J.; Stevenson, N.K.; Bookey, H.T.; Kar, A.K.; Brown, C.T.A.; Hopkins, J.-M.; Dawson, M.D.; Lagatsky, A.A.

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Optics Express 25 (2017), No.13, pp.14910-14917
ISSN: 1094-4087
Journal Article, Electronic Publication
Fraunhofer CAP ()

The ultrafast laser inscription technique has been used to fabricate channel waveguides in Tm3+-doped Lu2O3 ceramic gain medium for the first time to our knowledge. Laser operation has been demonstrated using a monolithic microchip cavity with a continuous-wave Ti:sapphire pump source at 796 nm. The maximum output power achieved from the Tm:Lu2O3 waveguide laser was 81 mW at 1942 nm. A maximum slope efficiency of 9.5% was measured with the laser thresholds observed to be in the range of 50-200 mW of absorbed pump power. Propagation losses for this waveguide structure are calculated to be 0.7 dB⋅cm−1 ± 0.3 dB⋅cm−1 at the lasing wavelength.