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Resistless Ga+ beam lithography for flexible prototyping of nanostructures in different materials by reactive ion etching

Presentation held at FOR3NANO: Formation of 3D Nanostructures by Ion Beams, June 28 - June 30, Helsinki, Finland
 
: Rommel, Mathias; Rumler, Maximilian; Haas, Anke; Beuer, Susanne

:
presentation urn:nbn:de:0011-n-4534668 (8.5 MByte PDF)
MD5 Fingerprint: 0752828f8d812aa0284c9633b4fa5569
Created on: 7.7.2017


2017, 24 Folien
Workshop "Formation of 3D Nanostructures by Ion Beams" (FOR3NANO) <2017, Helsinki>
Bundesministerium für Bildung und Forschung BMBF
01 EZ 1001C; Nanostrukturierte Cochleaelektroden zur elektrischen Charakterisierung sowie zur Manipulation von Zellen
English
Presentation, Electronic Publication
Fraunhofer IISB ()
focused ion beam (FIB); resistless Ga+ lithography; etch mask; dry etching; RIE; nanopatterning

: http://publica.fraunhofer.de/documents/N-453466.html