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Innovations in stationary magnetron sputtering of optical coatings

: Bartzsch, H.; Frach, P.; Weber, J.

Aegerter, M.A.; Kirchhoff, V. ; Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik -FEP-, Dresden:
Advanced Coatings for Large-Area or High-Volume Products. Proceedings of the 6th International Conference on Coatings on Glass and Plastics : June 18-22, 2006, Dresden, Germany
Dresden, 2006
International Conference on Coatings on Glass and Plastics (ICCG) <6, 2006, Dresden>
Conference Paper
Fraunhofer FEP ()

Optical films of high density and good environmental stability can be deposited at high deposition rate by magnetron sputtering. In this paper new developments in stationary deposition by pulsed reactive magnetron sputtering are presented. Using an electrically conducting target, e.g. silicon or aluminium, and pure or a mixture of reactive gases, e.g. oxygen and nitrogen, binary and ternary compounds are deposited. Fast and slow variations of the O2/N2- gas composition allow to produce multilayer and gradient films. This can be used for cost efficient antireflective coating of ophthalmic lenses at one deposition station in one coating step. The temperature rise is below 30 K allowing the coating of PC- and PMMAsubstrates. Complex filter structures including rugate filters with continuous or steep changes of refractive index are deposited within a very short time. Due to the uninterrupted coating process and by using special control loops a reproducibility of + 0.2 % from run to run and of +1 % over 48 h of continuous operation is achieved even without in-situ monitoring. Film thickness uniformity of the stationary deposition with the Double Ring Magnetron DRM 400 is +1 % across 200 mm diameter. Results on roughness, optical properties in the DUV and climatic stability will be reported. An estimation of coating costs for different applications will be given.