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Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation

: Frach, P.; Glöß, D.; Metzner, C.; Modes, T.; Scheffel, B.; Zywitzki, O.


Kusano, E.:
Selected Papers Revised from the Proceedings of the Eighth International Symposium on Sputtering and Plasma Processes, ISSP 2005 : 8 - 10 June 2005, Kanazawa, Japan
New York, NY: Pergamon, 2006 (Vacuum 80.2006,Nr.7)
International Symposium on Sputtering and Plasma Processes (ISSP) <8, 2005, Kanazawa>
Conference Paper, Journal Article
Fraunhofer FEP ()

Crystalline TiO2 thin films, especially layers with predominantly anatase phase, exhibit photocatalytic activities resulting in photoinduced hydrophilic, self-cleaning and antifogging properties. In this paper, a comparison of the photocatalytic properties of layers deposited with two different PVD techniques is given.
On one hand, a reactive pulse magnetron sputtering (PMS) system has been used to obtain TiO2 films at dynamic deposition rates from 8 to 50 nm m/min. On the other hand, TiO2 layers were deposited by reactive electron beam evaporation at very high deposition rates between 500 and 1000 nm m/min. An additional spotless arc discharge (Spotless arc Activated Deposition-SAD process) was used for plasma activation to improve layer properties. Photoinduced hydrophilicity was investigated by measuring the decrease of the water contact angle during UV-A irradiation.