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BELICHTUNGSANLAGE MIT HALTEEINRICHTUNG FUER EIN SUBSTRAT

Substrate holder for exposure apparatus, has two plates on movable table at different distances from surface, first plate directly joined to table, and second plate with substrate support surface.
 
: Schubert, G.; Kirschstein, U.; Risse, S.; Harnisch, G.; Kalkowski, G.; Guyenot, V.

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Frontpage ()

DE 1998-19853588 A: 19981120
EP 1999-963248 AW: 19991116
WO 1999-DE3638 A: 19991116
EP 1050070 B1: 20051019
H01L0021
German
Patent, Electronic Publication
Fraunhofer IOF ()

Abstract
WO 200031774 A UPAB: 20000811 NOVELTY - Holder has table (1) movable in a co-ordinate system on which substrate (18) is placed with substrate distance setting and alignment devices. Optical exposure arrangement (2) directs a corpuscular beam perpendicularly, i.e. in Z-axis direction, onto the substrate. Carrying plates (3,16) on table at different distances from table surface are parallel to X,Y plane. First plate (3) is directly joined to table, and second plate (16) is connected to the first via holder whose holding function can be switched on and off and has substrate supporting plane facing optical exposure arrangement. USE - For holding a substrate, especially masks and wafers, in an exposure system. ADVANTAGE - Developed to enable substrate support elements to be replaced rapidly and simply, yet with high positioning accuracy.

: http://publica.fraunhofer.de/documents/N-44434.html