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Schicht mit selektiv funktionalisierter Oberflaeche

Production of selectively functionalised layers, e.g. on metal or ceramic prior to painting, involves forming a surface layer by plasma deposition and selectively functionalising the surface by grafting on monomers.
 
: Klages, C.; Thyen, R.

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Frontpage ()

DE 1999-19953667 A: 19991108
DE 1999-19953667 A: 19991108
EP 2000-984979 A: 20001107
WO 2000-EP10983 A: 20001107
DE 19953667 A1: 20010517
EP 1230042 B1: 20030813
C23C0014
B05D0007
B05D0007
German
Patent, Electronic Publication
Fraunhofer IST ()

Abstract
Die vorliegende Erfindung betrifft eine Schicht, die mittels eines plasmagestuetzten Verfahrens auf einem Substrat abgeschieden worden ist, deren Oberflaeche durch Aufpfropfen von Monomeren selektiv funktionalisiert ist sowie ein Verfahren zur Herstellung einer derartigen Schicht und deren Verwendung.

 

DE 19953667 A UPAB: 20010829 NOVELTY - A process for the production of a layer with a selectively functionalised surface involves forming a layer on a substrate by plasma deposition and selectively functionalising the surface of the layer by grafting on monomers at reactive centres on the surface. DETAILED DESCRIPTION - A INDEPENDENT CLAIM is also included for a layer with a selectively functionalised surface obtained by plasma-assisted deposition and surface grafting with monomers (M). USE - Pretreatment of metal or ceramic substrates prior to the application of paint or other coating materials. ADVANTAGE - Enables the production of selectively functionalised surface layers with a dense covering of functional groups, especially groups which improve the attachment and adhesion of further layers, especially organic layers.

: http://publica.fraunhofer.de/documents/N-44363.html