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Challenges for predictive EUV mask modeling

Presentation held at International Workshop on EUV Lithography 2016, June 13-16, 2016, Berkeley, CA
 
: Evanschitzky, Peter; Erdmann, Andreas

:
presentation urn:nbn:de:0011-n-4391443 (1.7 MByte PDF)
MD5 Fingerprint: 800ce07d55b60ada4f6b9ad4e3cec2c6
Created on: 8.4.2017


2016, 23 Folien
International Workshop on EUV Lithography <2016, Berkeley/Calif.>
European Commission EC
H2020; 662338; SeNaTe
Seven Nanometer Technology
English
Presentation, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-439144.html