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Efficient simulation of EUV pellicles

Presentation held at 14th Fraunhofer IISB Lithography Simulation Workshop, September 22 - 24, 2016, Hersbruck, Germany
 
: Evanschitzky, Peter; Erdmann, Andreas

:
presentation urn:nbn:de:0011-n-4391430 (1.4 MByte PDF)
MD5 Fingerprint: 6018f0c6474fac903d1be47f9555e185
Created on: 8.4.2017


2016, 27 Folien
Lithography Simulation Workshop <14, 2016, Hersbruck>
European Commission EC
H2020; 662338; SeNaTe
Seven Nanometer Technology
English
Presentation, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-439143.html