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Ion sources for vacuum thin film technology

 
: Reuschling, R.; Schultheiß, E.

:

Vakuum in Forschung und Praxis 18 (2006), Supplement 1, Vacuum's Best, pp.46-51
ISSN: 0947-076X
ISSN: 1522-2454
English
Journal Article
Fraunhofer FEP ()
vacuum; Vakuum; Dünnschichttechnik; thin film; Ionenquelle

Abstract
Ion sources are used in vacuum thin film technology in various types and for numerous applications. This article provides an overview of basic features of ion sources and of the present status of ion source technology. This includes an explanation of the main parameters of such sources, typical set-up and applications, as well as power supply components.

: http://publica.fraunhofer.de/documents/N-43160.html